We enable the industrialization of nanolithography.

The EITRE® Nano Imprint Lithography (NIL) tools offer a semi-automated and affordable lithography solution, allowing pattern replication in the micro- and nanometer range.
The EITRE® tools are particularly versatile because of the multiple imprint process capabilities and the wide range of configuration possibilities.

OBDUCAT

EITRE 6

Obducat’s high performance MC204 WET modular tool provides cutting-edge solutions for current and future R&D and low volume manufacturing (LVM) requirements. The configuration flexibility of the MC204 Wet makes it adaptable to processing requirements in wide variety of applications such as LEDs, SiC components, 5G components, Si IC’s, MEMS, Opto-electronic, Photonic components and Advanced Packaging.

The system can handle substrate sizes from 2” to 8” Ø or 2” x 2“ to 6” x 6”.

OBDUCAT

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EITRE 6

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MC 204 WET

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