ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

ASML

TWINSCAN XT:1250D

The FPA-5000ES3 is a KrF scanner with a 0.73 NA, designed for 130nm production. It is built on the Canon FPA-5000 scanning platform and incorporates experience from previous models. The ES3 has significant refinements, particularly in lens performance, and employs unique lens elements using Canon’s “wavefront engineering” method. Lens testing results show values much smaller than the manufacturing target, in some cases by as much as 30-40%.

Canon Inc. is the world’s largest camera manufacturer with a history spanning over 80 years, during which time they have made some of the most important innovations within both photographic and video technology.

CANON

FPA-5000ES3

NSR-S308F (resolution ≦ 65 nm). The NSR-308F has a newly developed platform that enables dramatic improvements in alignment accuracy and throughput. Alignment accuracy has been reduced to 8 nm or less, a 44% improvement over Nikon’s previous generation ArF scanner, while throughput was increased to 140 wafers or more per hour for 300 mm wafers, an improvement of approximately 25%. With this significant increase in productivity, the system delivers next-generation process capabilities at a lower overall cost of ownership.

Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

NIKON

NSR-S308F

The ASML AT 1100 is a Steppers and Scanners system. The AT 1100 has Scanner 12".

AT:1100 is a 193 nm wavelength system with the industry's highest numerical aperture ArF lens (NA=0.75). Build upon ASML's successful 300 mm TWINSCAN dual-stage platform introduced in July 2000.

The AT:1100 achieves a throughput of 93 wafers-per-hour at a dose of 20 mJ/cm2. By separating the align and expose operations, more extensive and accurate alignment and wafer surface height mapping of the entire 300 mm wafer can be performed without impacting throughput. This increase in metrology accuracy is essential for delivering the 100 nm critical dimension control and less than 20 nm overlay across the wafer at full throughput. The AT:1100 introduces new 4 kHz ArF laser technology which contribute to its leading productivity advantage. The AT:1100 is designed for seamless mix-and-match operation with ASML's TWINSCAN product family.

193 nm Step and Scan

概要（Overview）

サービス

193 nm Step and Scan のメーカー

193 nm Step and Scan のトップ製品

TWINSCAN XT:1250D

FPA-5000ES3

NSR-S308F

TWINSCAN AT:1100