The AT:750 is a 248 nm deep UV system. 
The TWINSCAN platform allows either left- or right-hand configuration for optimum fab layout with track processing equipment and 300 mm automated materials handling systems. The KrF AT:750 is guaranteed for 130nm resolution with 20nm overlay accuracy and has a numerical aperture that is adjustable anywhere from 0.50 to 0.70 for optimal process latitude.

ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

TWINSCAN AT:750

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