Semiconductors control a host of functions in electronic equipment. Nikon offers a stellar lineup of cutting-edge lithography systems that support precision circuit design down to the nanometer level.

The system offers a resolution of 150 nm or better with a numerical aperture (NA) of 0.68. It utilizes a KrF excimer laser with a wavelength of 248 nm as the exposure light source. The reduction ratio is 1:4, and the exposure field measures 25 × 33 mm. The alignment accuracy, using the EGA method with |M| + 3σ, is equal to or less than 35 nm.

NIKON

NSR-S204B

NSR-S208D

The DUV Stepper is an all-in-one KrF system for high-volume production of advanced logic and memory ICs. It features a 0.60 NA sense for 0.25 micron resolution and can process over 85 200mm wafers per hour. The exposure area is 22mm x 22mm.

NSR-2205EX14C

NSR-2205EX12B

Throughput:
≧ 110 wafers/hour (300 mm wafer)
≧ 120 wafers/hour (200 mm wafer)

NSR-SF200

This Nikon Step-and-Repeat Scanning System is compatible with both 200mm and 300mm process nodes and has a resolution of resolution ≦ 130 nm. When the NSR S205C was originally released in 2000, it boasted the the world's first ultra-high N.A. (0.75) projection lens as well as a KrF excimer laser. The system can process 140+ 200mm wafers/hour (16% higher throughput than Nikon's previous system). Applications for the NSR S205C include mass production of DRAM and MPU.

NSR-S205C

NSR-S202A

Step-and-Repeat Scanning System NSR-S207D, a lens-scanning KrF excimer stepper for mass production of 110nm advanced devices incorporating an ultra-high N.A. lens. The NSR-S207D incorporates an ultra-high N.A. (N.A.O.82) projection lens, for the KrF excimer laser (248nm wavelength), and uses a newly developed body to significantly improve throughput performance and alignment accuracy.

NSR-S207D

NSR-S306D

NSR-S210D

NSR-S201A (resolution ≦ 250 nm), first scanner produced in the world.

NSR-S201A

NSR-1755EX8A

NSR-1505EX (resolution: 500 nm), first excimer stepper produced in the world.

NSR-1505EX

Stepper. NSR-S203B (resolution ≦ 180 nm). Ability to mass manufacture ICs with ultra-high-precision circuitry–specifically, sub-0.18µm minimum-pattern linewidth. 

NSR-S203B

NSR-2205EX14D

The NSR-S206D features a lens with the world’s highest numerical aperture (N.A. 0.82), along with 248nmwavelength
KrF excimer lasers. Incorporating a lens-based scanning system, this stepper enables mass
production of cutting-edge devices with 110nm or better design rules
using a KrF excimer laser. The NSR-S206D provides a high throughput
of 88 or more 300mm wafers/hour, or 147 or more 200mm wafers/hour

NSR-S206D

NSR-S205B

NSR-S220D

Resolution: ≦ 320 nm
Exposure light source: KrF excimer laser (248 nm wavelength)
Reduction ratio: 1:5
Exposure field: 22 mm square to 17.9 (H) × 25.2 (V) mm
Alignment accuracy (EGA, |M| + 3σ): ≦ 80 nm

NIKON

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トップNIKON 248nm DUV

NSR-S204B

NSR-S208D

NSR-2205EX14C

NSR-2205EX12B

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すべてのNIKON 248nm DUV