説明
GASONIC L3510 Single Wafer Downstream Photoresist Asher構成
8” configured (can change to 6”) Quartz Plasma Tube and Baffles ASTEX Microwave 1.2kw Temperature Controlled Wafer Cooled Aluminum Process Chamber Robotic Pick and Place Wafer Handler ( KORO ) Fixed Position Single Cassette Station Downstream End Point Detection SEMI SECS ⅱ Software 2 Gas Mass Flow Controller : O2 4slpm , N2 2slpm System Power : 208 VAC , 60 A, 3 Phase, 50/60HzOEMモデルの説明
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.ドキュメント
LAM RESEARCH / NOVELLUS / GASONICS
L3510
検証済み
カテゴリ
Ashers / Plasma Cleaner
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
82160
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
LAM RESEARCH / NOVELLUS / GASONICS
L3510
カテゴリ
Ashers / Plasma Cleaner
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
82160
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available