説明
Single Block 2C2DIIFB Right to Left Flow構成
Photo Resist Coat and Develop SystemOEMモデルの説明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
MARK 7
検証済み
カテゴリ
Coaters & Developers
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
59254
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
MARK 7
検証済み
カテゴリ
Coaters & Developers
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
59254
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Single Block 2C2DIIFB Right to Left Flow構成
Photo Resist Coat and Develop SystemOEMモデルの説明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.ドキュメント
ドキュメントなし