scia

MAGNA 200

Magna 200 Cluster 

PVD 

Scia Systems GmbH's (Supplier) off-axis AlN PVD Cluster tool “scia Cluster 200” is a sputter deposition tool consisting of a Brooks handler, one pre-clean chamber with ICP source, one PVD chamber capable of depositing Seed aluminum nitride, and one PVD chamber capable of depositing Bulk aluminum nitride on 200mm substrates.

The Equipment is designed for deposition of off-axis AlN and bulk AlN films. Wafers are transported via the Brooks handler through the system. Film deposition in the PVD seed chamber is done by reactive magnetron sputtering under a certain angle. The angular distribution of the system is narrowed by using a collimator system. The manually adjustable target to substrate distance and angle allows process optimization.

MAGNA 200

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scia

MAGNA 200

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MAGNA 200

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