
説明
TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes missing parts: 2 resist pumps, 1Developer Line構成
構成なしOEMモデルの説明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.ドキュメント
ドキュメントなし
カテゴリ
Coaters & Developers
最終検証: 今日
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
110894
ウェーハサイズ:
8"/200mm
ヴィンテージ:
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示TEL / TOKYO ELECTRON
MARK 7
カテゴリ
Coaters & Developers
最終検証: 今日
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
110894
ウェーハサイズ:
8"/200mm
ヴィンテージ:
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
TYP A M/C Typ FC-9801F#1 SD/HD Typ Commandpost System Vers. MK8G2.38 Alarm File ALM00166.OEN Sp. Al.File AL00TT.OEN GEM 1.72 Lines 1(3) Pumps 1xmini EBR programable T/H-Controller Semifab CD200 Backrinse yes Lines 1 x H-Nozzle Rinse yes Backrinse yes missing parts: 2 resist pumps, 1Developer Line構成
構成なしOEMモデルの説明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.ドキュメント
ドキュメントなし