説明

Details Attached

構成

2 coat / 2 develop system 4 – Cassette platforms 2 - Coat Modules 2 - Develop Modules 8 – Hot Plates 9 – Chill Plates 1 – WDS (wash disk system) A two block system / two robots (not counting carrier station) Parallel wafer flow processing software option (simultaneous coat & develop) Semifab CD 200+4TEL Temperature & Humidity Unit Chemical cabinet that contains SMC INR-244-117B Thermocons

OEMモデルの説明

Discover the CLEAN TRACK Mark 8, the cutting-edge coater developer system for 5 to 8-inch wafers. Building on the legacy of the acclaimed Mark V, this advanced model delivers enhanced productivity, superior scalability, and exceptional environmental control. Perfect for R&D and high-volume manufacturing, the Mark 8 ensures stable, top-tier performance for diverse applications.