説明
2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right, 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL Main Frame: Dual Block構成
2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE Main Frame: Single BlockOEMモデルの説明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
MARK 8
検証済み
カテゴリ
Coaters & Developers
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
105226
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
MARK 8
カテゴリ
Coaters & Developers
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
105226
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
2 develop cups, 1 coat cup, 4 chill hot plates, 3 chill plates, 3 low temp hot plates, WEE Right, 1C, 2D, 1WEE, 3HP, 4 CHP, 3 COL Main Frame: Dual Block構成
2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE Main Frame: Single BlockOEMモデルの説明
The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.ドキュメント
ドキュメントなし