説明
TEL DEVELOPER M?構成
構成なしOEMモデルの説明
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
MARK II
検証済み
カテゴリ
Coaters & Developers
最終検証： 25日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
117367
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
MARK II
カテゴリ
Coaters & Developers
最終検証： 25日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
117367
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
TEL DEVELOPER M?構成
構成なしOEMモデルの説明
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.ドキュメント
ドキュメントなし