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SEMVISION G5

カテゴリ
Defect Inspection
概要(Overview)

Semvision G5, enables chipmakers to image and analyze 20nm yield-limiting defects in a production environment without manual intervention. Uniquely capable of identifying and imaging relevant defects with 1nm pixel size, the SEMVision G5 system allows logic and memory customers to streamline manufacturing, pinpointing the root cause of defects faster and more accurately than ever before." The breakthrough SEMVision G5 system is an open architecture platform that dynamically combines data received from a wafer inspection system with a library of predefined review strategies. The system automatically creates new review recipes - a major benefit over competing tools that require time-consuming manual recipe creation for every chip type to be inspected. This feature is critical for foundry customers that must rapidly achieve good yield in the thousands of new chip designs they manufacture each year.

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