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APPLIED MATERIALS (AMAT) CENTURA TxZ
    説明
    HEATER
    構成
    構成なし
    OEMモデルの説明
    The Centura TxZ is a chemical vapor deposition (CVD) system that is used for depositing thin films of various materials on semiconductor wafers. It can be used with 8” wafer size and CVD system size is also 8”. In September 1996, the Liner TxZ Centura system was launched. This system combines a new CVD TiN chamber with a Coherent PVD Ti chamber, and allows for deposition of sequential layers of Ti and CVD TiN in high-aspect-ratio metal structures under vacuum. In September 1996, the Liner TxZ Centura system was launched. This system combines a new CVD TiN chamber with a Coherent PVD Ti chamber, and allows for deposition of sequential layers of Ti and CVD TiN in high-aspect-ratio metal structures under vacuum.
    ドキュメント

    ドキュメントなし

    APPLIED MATERIALS (AMAT)

    CENTURA TxZ

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    検証済み

    カテゴリ
    Deposition

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    106360


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
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    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA TxZ

    APPLIED MATERIALS (AMAT)

    CENTURA TxZ

    Deposition
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    APPLIED MATERIALS (AMAT)

    CENTURA TxZ

    verified-listing-icon
    検証済み
    カテゴリ
    Deposition
    最終検証: 60日以上前
    listing-photo-3fa554a4b2644d0691dd43c18978e9df-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    106360


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    HEATER
    構成
    構成なし
    OEMモデルの説明
    The Centura TxZ is a chemical vapor deposition (CVD) system that is used for depositing thin films of various materials on semiconductor wafers. It can be used with 8” wafer size and CVD system size is also 8”. In September 1996, the Liner TxZ Centura system was launched. This system combines a new CVD TiN chamber with a Coherent PVD Ti chamber, and allows for deposition of sequential layers of Ti and CVD TiN in high-aspect-ratio metal structures under vacuum. In September 1996, the Liner TxZ Centura system was launched. This system combines a new CVD TiN chamber with a Coherent PVD Ti chamber, and allows for deposition of sequential layers of Ti and CVD TiN in high-aspect-ratio metal structures under vacuum.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA TxZ

    APPLIED MATERIALS (AMAT)

    CENTURA TxZ

    Depositionヴィンテージ: 0状態: 中古最終検証:60日以上前