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LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
  • LAM RESEARCH / NOVELLUS ALTUS DirectFill MAX
説明
CVD
構成
W
OEMモデルの説明
ALTUS DirectFill is a tungsten nitride/tungsten deposition system designed for advanced contact and via-fill applications at 65 nm and below. It simplifies the tungsten deposition process by replacing the standard multi-tool Ti/TiN/W approach with a single three-module system. The advanced plug-fill technology of ALTUS DirectFill can reduce contact resistance and lower the overall cost of ownership by 50% or more when compared to existing processes. This makes it a cost-effective and efficient solution for advanced contact and via-fill applications.
ドキュメント

ドキュメントなし

カテゴリ
CVD

最終検証: 60日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

76014


ウェーハサイズ:

12"/300mm


ヴィンテージ:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS

ALTUS DirectFill MAX

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検証済み
カテゴリ
CVD
最終検証: 60日以上前
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主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

76014


ウェーハサイズ:

12"/300mm


ヴィンテージ:

2009


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
CVD
構成
W
OEMモデルの説明
ALTUS DirectFill is a tungsten nitride/tungsten deposition system designed for advanced contact and via-fill applications at 65 nm and below. It simplifies the tungsten deposition process by replacing the standard multi-tool Ti/TiN/W approach with a single three-module system. The advanced plug-fill technology of ALTUS DirectFill can reduce contact resistance and lower the overall cost of ownership by 50% or more when compared to existing processes. This makes it a cost-effective and efficient solution for advanced contact and via-fill applications.
ドキュメント

ドキュメントなし