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説明
Polysilicon Etch構成
構成なしOEMモデルの説明
The Centura 5200 DPS R1 is a high-performance metal etch system introduced by Applied Materials1. It delivers high-productivity silicon, metal, and dielectric etch2. The system has two enhanced chambers: the DPS etch chamber and the ASP+ (advanced strip and passivation) module. The Centura 5200 DPS R1 system is designed for 150mm and 200mm or 8" wafer sizes.ドキュメント
ドキュメントなし
カテゴリ
Dry / Plasma Etch
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
122925
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA 5200 DPS R1
カテゴリ
Dry / Plasma Etch
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
122925
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Polysilicon Etch構成
構成なしOEMモデルの説明
The Centura 5200 DPS R1 is a high-performance metal etch system introduced by Applied Materials1. It delivers high-productivity silicon, metal, and dielectric etch2. The system has two enhanced chambers: the DPS etch chamber and the ASP+ (advanced strip and passivation) module. The Centura 5200 DPS R1 system is designed for 150mm and 200mm or 8" wafer sizes.ドキュメント
ドキュメントなし