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市場 > Dry / Plasma Etch > APPLIED MATERIALS (AMAT) > CENTURA AP ADVANTEDGE G5

CENTURA AP ADVANTEDGE G5

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Dry / Plasma Etch
概要(Overview)

The Centura AP AdvantEdge G5 is a metal etch system by Applied Materials (AMAT) that is designed for 150mm and 200mm wafer sizes and addresses technology challenges that include high aspect ratio etch for a range of applications. It can be used for etching silicon, metal, and dielectric materials. It can also be used for polysilicon etch.

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