説明
説明なし構成
Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH EtchOEMモデルの説明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTURA ENABLER ETCH
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 5日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
119478
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
CENTURA ENABLER ETCH
カテゴリ
Dry / Plasma Etch
最終検証： 5日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
119478
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Dry Etch, Bx-, Cx-, E1 layers, 300mm wafers, 32nm BD/SICOH EtchOEMモデルの説明
The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot. To address advanced low k etch applications, the Applied Centura Enabler Etch system performs etch, strip and clean steps in a single chamber. The Enabler’s all-in-one capability streamlines the process flow for advanced chip designs and significantly reduces operating costs. Enabler Chamber: 300mm only.ドキュメント
ドキュメントなし