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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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CENTURA TRETRA Z

カテゴリ
Dry / Plasma Etch
概要(Overview)

Applied Materials Centura Tetra Z Photomask Etch system delivers state-of-the-art performance required to etch optical lithography photomasks for logic and memory devices at 10nm and beyond. The new system enhances the capabilities of the industry-leading Tetra platform to address advanced resolution enhancement techniques and extend immersion lithography for quadruple patterning with unprecedented CD performance.

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