説明
The NanoQuest I ion beam etching system is the ideal platform for etching single wafer substrates up to 4”. With a high cooling substrate stage, the system can etch through photo resist or masks to produce patterned substrates on any material. Technical Features: • Housed in compact one-piece frame with integral electronics rack to minimize lab space. • High vacuum design principles for quick cycle times and low ultimate pressure performance. • UHP Gas distribution ensures stable ion source operation. • Stainless steel frame with integral instrument rack, housing a touch screen LabView interface to PLC controller. • Completely automated; o pump down, o gas flow control, o ion source operation for repeatable and reliable etching of substrates. Condition:Not in full working condition Missing Components: 3 units of backing pumps (ACP15) & SIMs probe and controller構成
Ion Beam Etching System Chiller Model: Thermo Flex 1400 Chiller Model: Thermo Flex 1400 Power Magnetics Model: BC30G1-M/Z Diaphragm Vacuum Pump Adm 1 Model: 305230 Refurbished Pump Technical Features: • Ion milling system consisting of 1 etching chamber and load-lock. • Argon-based etching by physical ion bombardment etch equipped with in-situ SIMS endpoint detection technique. • Capable of angled etching for profile control. Specifications: • Materials for etching: Metal, dielectric, MRAM magnetic layers, hard-to-etch materials. • Gases for use: Ar • Endpoint Detection: Yes • Etch Uniformity: <5%OEMモデルの説明
The INTLVAC Nanoquest I is a versatile ion beam etching (IBE) system designed for precision substrate fabrication. It is capable of etching single wafer substrates up to 4 inches in diameter, with the option to expand to 5 inches for specialized configurations. The system features a high cooling flow substrate stage, allowing for etching through photoresist or masks to create patterned substrates on various materials. Its compact design includes an integral electronics rack, minimizing lab or cleanroom space requirements. The Nanoquest I also offers full automation of pump down, gas flow control, and ion source operation, ensuring repeatable and reliable etching processes.ドキュメント
ドキュメントなし
INTLVAC
Nanoquest I
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled / Uncrated
製品ID：
82097
ウェーハサイズ：
4"/100mm, 5"/125mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
INTLVAC
Nanoquest I
カテゴリ
Dry / Plasma Etch
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled / Uncrated
製品ID：
82097
ウェーハサイズ：
4"/100mm, 5"/125mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
The NanoQuest I ion beam etching system is the ideal platform for etching single wafer substrates up to 4”. With a high cooling substrate stage, the system can etch through photo resist or masks to produce patterned substrates on any material. Technical Features: • Housed in compact one-piece frame with integral electronics rack to minimize lab space. • High vacuum design principles for quick cycle times and low ultimate pressure performance. • UHP Gas distribution ensures stable ion source operation. • Stainless steel frame with integral instrument rack, housing a touch screen LabView interface to PLC controller. • Completely automated; o pump down, o gas flow control, o ion source operation for repeatable and reliable etching of substrates. Condition:Not in full working condition Missing Components: 3 units of backing pumps (ACP15) & SIMs probe and controller構成
Ion Beam Etching System Chiller Model: Thermo Flex 1400 Chiller Model: Thermo Flex 1400 Power Magnetics Model: BC30G1-M/Z Diaphragm Vacuum Pump Adm 1 Model: 305230 Refurbished Pump Technical Features: • Ion milling system consisting of 1 etching chamber and load-lock. • Argon-based etching by physical ion bombardment etch equipped with in-situ SIMS endpoint detection technique. • Capable of angled etching for profile control. Specifications: • Materials for etching: Metal, dielectric, MRAM magnetic layers, hard-to-etch materials. • Gases for use: Ar • Endpoint Detection: Yes • Etch Uniformity: <5%OEMモデルの説明
The INTLVAC Nanoquest I is a versatile ion beam etching (IBE) system designed for precision substrate fabrication. It is capable of etching single wafer substrates up to 4 inches in diameter, with the option to expand to 5 inches for specialized configurations. The system features a high cooling flow substrate stage, allowing for etching through photoresist or masks to create patterned substrates on various materials. Its compact design includes an integral electronics rack, minimizing lab or cleanroom space requirements. The Nanoquest I also offers full automation of pump down, gas flow control, and ion source operation, ensuring repeatable and reliable etching processes.ドキュメント
ドキュメントなし