Three load port
Three chamber
Has esc / robot  / controller

LAM RESEARCH CORPORATION

The 2300 Kiyo E is part of Lam’s Kiyo product family, which delivers high-performance capabilities to precisely and consistently form conductive features with high productivity. The Kiyo E series is designed to address the challenges of the semiconductor industry, such as processing smaller features, new materials, and new transistor structures on the wafer. It offers superior uniformity and repeatability, enabled by a symmetrical chamber design, industry-leading electrostatic chuck technology, and independent process tuning features. Additionally, it has high productivity with low defectivity on multi-film stacks, enabled by in-situ etch capability, continuous plasma, and advanced waferless auto-clean technology. The Kiyo E series also offers improved critical dimension uniformity using proprietary Hydra technology that corrects for incoming patterning variability and atomic-scale variability control with production-worthy throughput enabled by plasma-enhanced ALE capability. The product is upgradable for low cost of ownership over several device generations.

LAM RESEARCH CORPORATION

2300 KIYO E

Dry / Plasma Etch

同様のリスト

2300 KIYO E

Dry / Plasma Etch

同様のリスト