説明
Chemical Dry Etch (CDE)構成
構成なしOEMモデルの説明
Certas WING™ is the 2nd generation plasma-free gas chemical etch system from Tokyo Electron targeted at selective oxide film etching. Productivity of the new tool has been improved with twice the throughput while maintaining the same footprint. The Certas WING™ process capability has been expanded to achieve higher etch volumes and provide flexibility for etching of a wider variety of silicon based films that will be used in future semiconductor device manufacturing.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
Certas WING
検証済み
カテゴリ
Dry / Plasma Etch
最終検証： 15日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
113853
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
Certas WING
カテゴリ
Dry / Plasma Etch
最終検証： 15日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
113853
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Chemical Dry Etch (CDE)構成
構成なしOEMモデルの説明
Certas WING™ is the 2nd generation plasma-free gas chemical etch system from Tokyo Electron targeted at selective oxide film etching. Productivity of the new tool has been improved with twice the throughput while maintaining the same footprint. The Certas WING™ process capability has been expanded to achieve higher etch volumes and provide flexibility for etching of a wider variety of silicon based films that will be used in future semiconductor device manufacturing.ドキュメント
ドキュメントなし