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TEL / TOKYO ELECTRON TELIUS SP 305 SCCM
    説明
    Dielectric Etch
    構成
    <p>Tool is operating in clean room.</p><p> </p><p>[Chamber A]</p><p>Chamber type:DRM</p><p>Gas config. (sccm)=FCS full scale</p><p> 2line(advanced radical distribution control)</p><p> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</p><p> CF4(336)/CHF3(163)/CH2F2(144)/CH3F(163)</p><p> N2(300)/CO(500)/C4F6(50.3)</p><p> O2(18.7)/N2(30)/CH2F2(14.4)</p><p>RF 13.56MHz, max 5000W</p><p>Temp Top +30~+80℃</p><p>     Wall +40~+80℃</p><p>     ESC -10~+60℃</p><p> </p><p>[Chamber B]</p><p>Chamber type:DRM</p><p>Gas config. (sccm)=FCS full scale</p><p> 2line(advanced radical distribution control)</p><p> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</p><p> CF4(336)/CHF3(163)/CH2F2(144)/CH3F(163)</p><p> N2(300)/CO(500)/C4F6(50.3)</p><p> O2(18.7)/N2(30)/CH2F2(14.4)</p><p>RF 13.56MHz, max 5000W</p><p>Temp Top +30~+80℃</p><p>     Wall +40~+80℃</p><p>     ESC -10~+60℃</p><p> </p><p>Pictures will be collected.</p><p>Missing or damaged parts: Not reported.</p>
    OEMモデルの説明
    Telius-SP is a high-performance etching system designed for large diameter (300 mm) requirements. It is part of the Telius platform and offers improved productivity through increased throughput, a reduced footprint, and higher energy efficiency. The system can be fitted with various chamber applications, including DRM and SCCM chambers, to support a wide range of process areas. It can support up to 4 chambers and boasts a high throughput, compact design, and low cost of ownership (CoO). Additionally, the system is designed for ease of maintenance. Overall, Telius-SP is a versatile and cost-effective solution for large diameter etching needs.
    ドキュメント

    ドキュメントなし

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    verified-listing-icon

    検証済み

    カテゴリ
    Dry / Plasma Etch

    最終検証: 19日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    21133


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma Etch
    ヴィンテージ: 2008状態: 中古
    最終確認60日以上前

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    verified-listing-icon
    検証済み
    カテゴリ
    Dry / Plasma Etch
    最終検証: 19日前
    listing-photo-SOFY4og6853aMkuBiXOSJZiH1iwFnKw_T2Q-MI1xJcg-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    21133


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Dielectric Etch
    構成
    <p>Tool is operating in clean room.</p><p> </p><p>[Chamber A]</p><p>Chamber type:DRM</p><p>Gas config. (sccm)=FCS full scale</p><p> 2line(advanced radical distribution control)</p><p> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</p><p> CF4(336)/CHF3(163)/CH2F2(144)/CH3F(163)</p><p> N2(300)/CO(500)/C4F6(50.3)</p><p> O2(18.7)/N2(30)/CH2F2(14.4)</p><p>RF 13.56MHz, max 5000W</p><p>Temp Top +30~+80℃</p><p>     Wall +40~+80℃</p><p>     ESC -10~+60℃</p><p> </p><p>[Chamber B]</p><p>Chamber type:DRM</p><p>Gas config. (sccm)=FCS full scale</p><p> 2line(advanced radical distribution control)</p><p> Ar(754)/C4F8(43)/O2(46.8)/O2(1215)</p><p> CF4(336)/CHF3(163)/CH2F2(144)/CH3F(163)</p><p> N2(300)/CO(500)/C4F6(50.3)</p><p> O2(18.7)/N2(30)/CH2F2(14.4)</p><p>RF 13.56MHz, max 5000W</p><p>Temp Top +30~+80℃</p><p>     Wall +40~+80℃</p><p>     ESC -10~+60℃</p><p> </p><p>Pictures will be collected.</p><p>Missing or damaged parts: Not reported.</p>
    OEMモデルの説明
    Telius-SP is a high-performance etching system designed for large diameter (300 mm) requirements. It is part of the Telius platform and offers improved productivity through increased throughput, a reduced footprint, and higher energy efficiency. The system can be fitted with various chamber applications, including DRM and SCCM chambers, to support a wide range of process areas. It can support up to 4 chambers and boasts a high throughput, compact design, and low cost of ownership (CoO). Additionally, the system is designed for ease of maintenance. Overall, Telius-SP is a versatile and cost-effective solution for large diameter etching needs.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma Etchヴィンテージ: 2008状態: 中古最終検証:60日以上前
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma Etchヴィンテージ: 0状態: 中古最終検証:19日前
    TEL / TOKYO ELECTRON TELIUS SP 305 SCCM

    TEL / TOKYO ELECTRON

    TELIUS SP 305 SCCM

    Dry / Plasma Etchヴィンテージ: 2007状態: 中古最終検証:19日前