NE-550EXz
概要（Overview）
Under high vacuum conditions, plasma is generated by RF high-frequency discharge, and under the action of bias voltage, specific materials are removed through physical and chemical effects. Etching materials: metal, GaN, In P, SiO2, Si, Polymide and other materials. Load-lock type, fully automatic control, patented ISM electrode, high uniformity, good stability, simple structure and easy maintenance.
現在の掲載品
0
サービス
検査、保証、鑑定、ロジスティクス
トップ掲載リスト
- 製品が見つかりません