説明
説明なし構成
Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.OEMモデルの説明
提供なしドキュメント
ドキュメントなし
DESPATCH
LCB
検証済み
カテゴリ
Oven
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
15266
ウェーハサイズ:
不明
ヴィンテージ:
不明
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Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
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Refurbishment Services
Available
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DESPATCH
LCB
検証済み
カテゴリ
Oven
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
15266
ウェーハサイズ:
不明
ヴィンテージ:
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Despatch Batch Magnetic Vacuum Annealing Oven. The oven body exterior sides and rear wall are constructed of polished 18 gauge non-magnetic stainless steel with a No. 4 finish. Permanent magnet is located between the inner and outer oven walls. Wafer Capacity (6 in. dia.): 15 max., one per tray. Operating Temp. Range: 60 deg C (140 deg F) to 300 deg C (572 deg F). Max. Design Temp.: 300 deg C (572 deg F). Heating Medium: Air/Nitrogen. Temp. Ramp Rate: Up to 5 deg C (9 deg F)/minute. Wafer temperature uniformity during temperature ramp within +/-2 deg C. Wafer temperature uniformity during stable soak conditions within +/-1 deg C. Vacuum Level: 50 mTorr.OEMモデルの説明
提供なしドキュメント
ドキュメントなし
同様のリスト
すべて表示同様のリストが見つかりません