説明
説明なし構成
PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTPドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
検証済み
カテゴリ
Epitaxial deposition (EPI)
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
27602
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA 5200 TPCC
検証済み
カテゴリ
Epitaxial deposition (EPI)
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
27602
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
PolyGen Chamber Single wf Boron doped poly deposition @ reduced pressure (gas: B2H6, SiH4; pressure 275 Torr; temperature: 730 C) Chamber: POLYgen 200 TPCC The chamber was UP and running before decommissioning, installed on AMAT CENTURA mainframe in position “D”OEMモデルの説明
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTPドキュメント
ドキュメントなし