説明
Generation 3構成
3rd Generation - G3 Zeta - Software operational meaning cpu boots up - 1 console with qty 4 canisters - 300mm table - FDM - PM - Power Distribution pannelOEMモデルの説明
The ZETA Surface Conditioning System is a fully automated centrifugal spray processor designed for advanced, batch cleaning, etching and stripping applications on 200-mm and 300-mm wafers. The system is completely closed, providing greater process control and repeatability in an extremely clean environment. Compared to traditional wet cleaning technologies, the ZETA system uses less fab space and chemicals and operates at a much lower cost. It performs a variety of etching applications, including patterned aluminum etch/strip, wafer reclaim, oxide etch/strip, and polysilicon deglaze.ドキュメント
ドキュメントなし
TEL / FSI
ZETA
検証済み
カテゴリ
Etch/Asher
最終検証： 19日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
12620
ウェーハサイズ：
8"/200mm, 12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示同様のリストが見つかりません
TEL / FSI
ZETA
カテゴリ
Etch/Asher
最終検証： 19日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
12620
ウェーハサイズ：
8"/200mm, 12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Generation 3構成
3rd Generation - G3 Zeta - Software operational meaning cpu boots up - 1 console with qty 4 canisters - 300mm table - FDM - PM - Power Distribution pannelOEMモデルの説明
The ZETA Surface Conditioning System is a fully automated centrifugal spray processor designed for advanced, batch cleaning, etching and stripping applications on 200-mm and 300-mm wafers. The system is completely closed, providing greater process control and repeatability in an extremely clean environment. Compared to traditional wet cleaning technologies, the ZETA system uses less fab space and chemicals and operates at a much lower cost. It performs a variety of etching applications, including patterned aluminum etch/strip, wafer reclaim, oxide etch/strip, and polysilicon deglaze.ドキュメント
ドキュメントなし
同様のリスト
すべて表示同様のリストが見つかりません