The March Jupiter III is a parallel plate reactive ion etcher, which offers fast, uniform, and selective etching. The Jupiter III is typically used for wafer descumming and ashing. The maximum sample size is 6 inches. The system is equipped with a maximum 300W RF power supply. The available process gases are oxygen, argon, and forming gas which are adjustable using a rotameter.

Nordson MARCH was formed through the merging of March Instruments of Concord, California, USA and Advanced Plasma Systems (APS) of St. Petersburg, Florida, USA. The company was acquired in 1999 by Nordson Corporation and referred to as March Plasma Systems until renamed Nordson MARCH in 2009.

https://www.nordson.com/en/divisions/march

Jupiter III

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