1. PSS mass production dry etching equipment for 2", 4", 6" LED patterned sapphire substrates.
2. High-density plasma design improves etching rate and productivity.
3. Good etching uniformity.
4. Low operating cost. Simple operation and easy maintenance.

AST Juchang Technology has always been full of infinite ideals and enthusiasm for the optoelectronic semiconductor equipment industry.Thin film process: (1) E-Beam Evaporator (Electron Beam Evaporator), (2) Resistance Heating Evaporator (Resistance Heating Evaporator). Etching process: (1) TCP-RIE (High Density Plasma Reactive Ion Etching Equipment), (2) RIE (Reactive Ion Etching Equipment).

MP-370

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