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RAINBOW 4600

カテゴリ
Plasma Etch
概要(Overview)

The Rainbow 4600 is part of the Rainbow series of etch systems, first introduced in 1987. This series of products addresses processes that utilize wafer sizes up to 200mm and feature sizes as small as 0.35 micron. The Rainbow 4600 is specifically designed for etching tungsten films. These systems are designed to accommodate evolving customer needs through hardware and process enhancements. The Rainbow product series incorporates a number of unique features that offer semiconductor manufacturers improved etch capability, reliability, and performance. These features include a patented wafer handling system, a proprietary source for generating stable plasma, and an overall product design for which Lam has received industry awards for quality and reliability. These and other features of the Rainbow product are designed to enable the semiconductor manufacturer to reduce wafer particle contamination to a level that exceeds industry standards, and to improve etch selectivity and uniformity while maintaining profile control and process flexibility.

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