説明
説明なし構成
The FEI FIB 200-S uses the Sidewinder ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication and nanoprototyping and MEMS. • Sidewinder column 500V – 30kV; excellent beam profile and stability • Milling Power: 21nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis, comp-eucentric tilt stage • Full coverage of 80mm diameter • Front door load • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVPOEMモデルの説明
The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.ドキュメント
ドキュメントなし
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 200
検証済み
カテゴリ
FIB
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
12442
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 200
検証済み
カテゴリ
FIB
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
12442
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
The FEI FIB 200-S uses the Sidewinder ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication and nanoprototyping and MEMS. • Sidewinder column 500V – 30kV; excellent beam profile and stability • Milling Power: 21nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis, comp-eucentric tilt stage • Full coverage of 80mm diameter • Front door load • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVPOEMモデルの説明
The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.ドキュメント
ドキュメントなし