説明
説明なし構成
The FIB 800-M uses Magnum ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication, nanoprototyping and MEMS. • Magnum ion column, 5–30kV • Milling Power: 21nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis motorized eucentric tilt stage • Full coverage of 200mm diameter sample • XYZRT: 200 x 200 x 25mm x n x 360° x -15° +60° • 200mm load lock • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVP • Includes installation, operational training and 90day warranty.OEMモデルの説明
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.ドキュメント
ドキュメントなし
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 800
検証済み
カテゴリ
FIB
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
16352
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 800
検証済み
カテゴリ
FIB
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
16352
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
The FIB 800-M uses Magnum ion column. This FIB is used for circuit edit (front and back side), defect and failure analysis, TEM lamella prep, nanofabrication, nanoprototyping and MEMS. • Magnum ion column, 5–30kV • Milling Power: 21nA beam current • CDEM for ions and electron images with 7nm image resolution • Windows OS and FEI UI; TSS networking computer to make IT happy • 5-axis motorized eucentric tilt stage • Full coverage of 200mm diameter sample • XYZRT: 200 x 200 x 25mm x n x 360° x -15° +60° • 200mm load lock • Chamber scope for real time observation • Gas Injection System: Max 4 injectors; 2 included, chemistry of choice • Vacuum System: column IGP, air cooled Turbo and mechanical PVP • Includes installation, operational training and 90day warranty.OEMモデルの説明
The FEI FIB 800 is a state-of-the-art Focused Ion Beam (FIB) system that is utilized for a variety of applications, including circuit editing, defect and failure analysis, TEM lamella preparation, nanofabrication, nanoprototyping, and MEMS. It employs a Magnum ion column and boasts a milling power of 21nA beam current. The system can accommodate samples with diameters up to 200mm and features a 5-axis motorized eucentric tilt stage. Additionally, it includes a gas injection system with up to four injectors and a vacuum system with column IGP, air-cooled Turbo, and mechanical PVP.ドキュメント
ドキュメントなし