Reticle Masking: Four independent blades; full field of travel
Alignment System: Dual automatic through-the-lens using diffraction grating marks directly referenced to reticle alignment system
Illumination System: Elliptical mirror and fly's eye integrator
Position Control: Three-axis HP laser interferometer system

ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

ASML

The ASML PAS 2500/40 is an I-Line (365nm) stepper with a working resolution of 0.7 micron. It is used for IC production on 3, 4, 5 and 6 inch wafers. The PAS 2500/40 stepper uses a 0.40 NA i-line lens with a 21.1mm image field diameter and is optimized for sub 0.7micron production resolutions using i-line processes.

PAS 2500/40

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ASML

PAS 2500/40

Steppers & Scanners

同様のリスト

ASML

PAS 2500/40

ASML

PAS 2500/40

ASML

PAS 2500/40

ASML

PAS 2500/40

PAS 2500/40

Steppers & Scanners

同様のリスト

ASML

PAS 2500/40

ASML

PAS 2500/40

ASML

PAS 2500/40

ASML

PAS 2500/40