The PAS 5500/400D is a stepper and scanner equipped with a 4x projection lens, enhanced by ASML's AERIAL Illuminator to deliver a 280-nm resolution. Its Step-and-Scan stage technology, paired with advanced i-line resists, offers throughputs of 124 200-mm wph, ensuring cost-efficient operation for advanced i-line lithography. Furthermore, it achieves a mask overlay of 35 nanometers and amplifies surface energy density by tenfold.

ASML provides chipmakers with everything they need – hardware, software and services – to mass produce patterns on silicon through lithography.

PAS 5500/400D

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