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G1510

カテゴリ
High Energy
概要(Overview)

Tandetron 1520 and Genus 1510. Introduced in 1995 and 1992, respectively, the Tandetron 1520 and Genus 1510 were Genus' previous generation MeV ion implant products. The 1510 is a second-generation high energy ion implanter and is an evolution of the market leader Genus 1500 system. In this work, a review of the key performance characteristics of the system are presented from a users point of view. Included are parameters such as beam current, beam stability, implant profiles, wafer throughput, particle performance, ease of operation, and serviceability.

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