The fluorine F2 laser is the first 157-nm laser to offer a repetition rate of 1000 Hz, which makes possible the extension of optical lithography for devices with feature sizes below 100 nm.

ASML Holding NV (ASML) and Cymer, Inc. announced that they have completed the previously announced merger pursuant to which ASML has acquired Cymer.

Cymer, an ASML company, is an industry leader in developing lithography light sources, used by chipmakers worldwide to pattern advanced semiconductor chips. Cymer's light sources, and ongoing innovations, are available to all semiconductor companies to enable advanced device manufacturing today and into the future. Cymer is pioneering the industry's transition to EUV lithography, the next viable step on the technology roadmap for the creation of smaller, faster and more energy-efficient chips. 

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