Advancing DUV lithography further, the XLR 500i is the world’s first ArF light source for 45nm immersion production. Based on the dual chamber MOPA platform, XLR introduces Cymer Recirculating Ring Technology, a process that extends the life of the chambers.

ASML Holding NV (ASML) and Cymer, Inc. announced that they have completed the previously announced merger pursuant to which ASML has acquired Cymer.

Cymer, an ASML company, is an industry leader in developing lithography light sources, used by chipmakers worldwide to pattern advanced semiconductor chips. Cymer's light sources, and ongoing innovations, are available to all semiconductor companies to enable advanced device manufacturing today and into the future. Cymer is pioneering the industry's transition to EUV lithography, the next viable step on the technology roadmap for the creation of smaller, faster and more energy-efficient chips. 

XLR 500i

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