The XLR® 600i, the first 90W ArF light source designed for high volume immersion production and double patterning lithography at 32nm and beyond.

ASML Holding NV (ASML) and Cymer, Inc. announced that they have completed the previously announced merger pursuant to which ASML has acquired Cymer.

Cymer, an ASML company, is an industry leader in developing lithography light sources, used by chipmakers worldwide to pattern advanced semiconductor chips. Cymer's light sources, and ongoing innovations, are available to all semiconductor companies to enable advanced device manufacturing today and into the future. Cymer is pioneering the industry's transition to EUV lithography, the next viable step on the technology roadmap for the creation of smaller, faster and more energy-efficient chips. 

XLR 600i

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