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市場 > Lithography > CRESTEC > CABL-9000C

CABL-9000C

カテゴリ
Lithography
概要(Overview)

-Small spot size same as 100kV tool but more stable -High Beam position resolution-0.0012nm minimum address size with FSM -Proper Stigmation & Focusing adjustment with Clear SEM -Stable beam position for a long period of time -Uniformed Beam current in the field -Stable Beam current for a long time -Noise reduction by specially designed of P/S & Permalloy box. -Initial correction of field distortion has to be done properly for good stitching -Deflection has to be electrostatic deflection for good stitching -Unique way to use laser interferometer prevent measurement error for good stitching -Self thermal control minimizes the measurement error for good stitching Many writing functions - Vector (X-Y), - Vector (X-Theta), - Raster, - Spot, - Axial symmetrical Pattern writing, - Field Size Modulation, - Spot scan, - 3D pattern writing -Proximity effect correction -Multi user environment – saving parameters for each different users -User friendly – Windows Xp based software and DXF & GDSII conversion -Flexible customization – Different Palette Holder

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