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市場 > Lithography > ASML / CYMER > NanoLith 7000

NanoLith 7000

カテゴリ
Lithography
概要(Overview)

The NanoLith 7000 is an ArF laser system designed for 193-nm lithography tools. It operates at an impressive 4-kilohertz repetition rate, setting new standards for high-speed scanners in volume production fabs. The NanoLith 7000 boasts enhanced thermal management and optimized gas flow for 20-watt average output power at 100% duty cycle. It enables full, high-contrast imaging for 200-mm and 300-mm lithography steppers with >0.75 NA lenses, revolutionizing high-speed scanners in volume production fabs.

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