概要（Overview）

The MLA 300 features our powerful Maskless Aligner technology that has been specifically adapted to the requirements of high-throughput production applications: You can now employ the unmatched flexibility of maskless lithography in an industrial setting, on wafers with sizes up to 300 x 300 mm2. Lithography no longer depends on a fixed mask, but can dynamically adapt to surface and process variations from previous fabrication steps.