JEOL

JBX3040

Introducing the JBX-6300FS, a cutting-edge electron beam lithography system. It effortlessly writes patterns down to 8nm (actual result: 5nm) using an electron optical system with a 2.1nm-diameter electron beam at 100kV. Achieving high field-stitching and overlay accuracy of 9nm or less, it ensures exceptional cost performance. JEOL's unique automatic correction function allows high-precision pattern writing. Addressing various needs, from cutting-edge device R&D to nanotechnology and communication-device production, JBX-6300FS sets a new standard in electron beam lithography.

JBX-6300FS

JBX-3030

JBX 5500FS

JBX 9300FS

The JBX-8100FS writes ultrafine patterns at a faster rate of speed while minimizing idle time, especially during the exposure process, thus increasing throughput.

This new, high precision compact e-beam tool is suitable for a wide range of applications from research to production, while its small footprint and low power consumption reduce cost of ownership.

Main Features:
-Small footprint:
The area required for the standard system is 4.9 m (W) x 3.7 m (D) x 2.6 m (H), much smaller than the conventional systems.
-Low power consumption:
Power needed for normal operation is approximately 3 kVA, reduced to 1/3 of the conventional systems.
-High throughput:
The system has two exposure modes, high resolution and high throughput modes, supporting different types of patterning from ultra fine processing to small to mid size production. It has minimized the idle time during exposure while increasing the maximum scanning speed by 1.25 to 2.5 times to 125 MHz (the world’s highest level) for high speed writing.
-Version:
The JBX-8100FS is available in 2 versions: G1 (entry model) and G2 (full option model). Optional accessories can be added to the G1 model as needed.
-New Functions:
An optional optical microscope is available to enable examination of patterns on the sample without exposing resist to light. A signal tower is provided as standard for visual monitoring of system operation.
-Laser positioning resolution:
Stage positions are measured and controlled in 0.6 nm steps as standard, and in 0.15 nm steps with an optional upgrade.
-System control:
Versatile Linux® operating system combined with a new graphic user interface provides ease in operation. The data preparation program supports both Linux® and Windows®.

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JBX-6300FS

JBX-3030

JBX 5500FS

JBX3040

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