概要（Overview）

The high resolution direct laser lithography system Dilase 650 offers you the possibility to work with one or two writing lasers, to be focused into one or two beam sizes ranging from 1µm to 50µm automatically switchables. It allows the writing on any type of substrate (photolithography masks, semiconductors, glass, polymers, crystals, flexible films...) over a surface area as large as 6 inches.