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nB5
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Lithography概要（Overview）
Round-beam vector-scan system using a step-and- repeat method for nanopatterning, and has been specially designed for mix-and-match lithography. Specification: Beam Voltage range 20kV - 100kV Feature size on resist <8nm Stitching/overlay error <25nm for 500um field Automatic loading 5 chuck airlock system
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