説明
Working condition, no known issues構成
• Windows Based Operator Workstation • Drawer in Front (B) Base Configuration • Robotic Loader • PATMAX MVS Alignment System • Step Specific Processing Mode Software • 30 x 15 mm Field Size - Manual Aperture • 6-inSubstrates • 3 X 5 Inch Reticles • Lens Distortion Reference - No Lens Matching • 115V Power Source • Four Color Signal Light Tower • Single Probe Focus Software • Focus Mapping (Grid Focus) Software • MVS Manual Alignment Software • Topside EGA Software * Wafer Thickness Compensator (4 mm Max Thickness)OEMモデルの説明
The Sapphire 100 is also based on the 1000 Series platform, with additional features developed specifically for HBLED lithography applications. HBLED manufacturing requires special substrate handling capabilities for the small diameter sapphire and silicon carbide substrates used to manufacture the LED devices for display backlighting and general lighting applications. For HBLED applications, we believe our Sapphire 100 stepper offers depth of focus, productivity and yield improvement advantages over competitive product offerings.ドキュメント
ドキュメントなし
VEECO / ULTRATECH
SAPPHIRE 100
検証済み
カテゴリ
Lithography
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Running
製品ID：
90681
ウェーハサイズ：
2"/50mm, 3"/75mm, 4"/100mm
ヴィンテージ：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
VEECO / ULTRATECH
SAPPHIRE 100
カテゴリ
Lithography
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Running
製品ID：
90681
ウェーハサイズ：
2"/50mm, 3"/75mm, 4"/100mm
ヴィンテージ：
2011
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Working condition, no known issues構成
• Windows Based Operator Workstation • Drawer in Front (B) Base Configuration • Robotic Loader • PATMAX MVS Alignment System • Step Specific Processing Mode Software • 30 x 15 mm Field Size - Manual Aperture • 6-inSubstrates • 3 X 5 Inch Reticles • Lens Distortion Reference - No Lens Matching • 115V Power Source • Four Color Signal Light Tower • Single Probe Focus Software • Focus Mapping (Grid Focus) Software • MVS Manual Alignment Software • Topside EGA Software * Wafer Thickness Compensator (4 mm Max Thickness)OEMモデルの説明
The Sapphire 100 is also based on the 1000 Series platform, with additional features developed specifically for HBLED lithography applications. HBLED manufacturing requires special substrate handling capabilities for the small diameter sapphire and silicon carbide substrates used to manufacture the LED devices for display backlighting and general lighting applications. For HBLED applications, we believe our Sapphire 100 stepper offers depth of focus, productivity and yield improvement advantages over competitive product offerings.ドキュメント
ドキュメントなし