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VEECO / ULTRATECH SAPPHIRE 100
    説明
    Working condition, no known issues
    構成
    • Windows Based Operator Workstation • Drawer in Front (B) Base Configuration • Robotic Loader • PATMAX MVS Alignment System • Step Specific Processing Mode Software • 30 x 15 mm Field Size - Manual Aperture • 6-inSubstrates • 3 X 5 Inch Reticles • Lens Distortion Reference - No Lens Matching • 115V Power Source • Four Color Signal Light Tower • Single Probe Focus Software • Focus Mapping (Grid Focus) Software • MVS Manual Alignment Software • Topside EGA Software * Wafer Thickness Compensator (4 mm Max Thickness)
    OEMモデルの説明
    The Sapphire 100 is also based on the 1000 Series platform, with additional features developed specifically for HBLED lithography applications. HBLED manufacturing requires special substrate handling capabilities for the small diameter sapphire and silicon carbide substrates used to manufacture the LED devices for display backlighting and general lighting applications. For HBLED applications, we believe our Sapphire 100 stepper offers depth of focus, productivity and yield improvement advantages over competitive product offerings.
    ドキュメント

    ドキュメントなし

    VEECO / ULTRATECH

    SAPPHIRE 100

    verified-listing-icon

    検証済み

    カテゴリ
    Lithography

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    Installed / Running


    製品ID:

    90681


    ウェーハサイズ:

    2"/50mm, 3"/75mm, 4"/100mm


    ヴィンテージ:

    2011

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    VEECO / ULTRATECH SAPPHIRE 100

    VEECO / ULTRATECH

    SAPPHIRE 100

    Lithography
    ヴィンテージ: 2011状態: 中古
    最終確認60日以上前

    VEECO / ULTRATECH

    SAPPHIRE 100

    verified-listing-icon
    検証済み
    カテゴリ
    Lithography
    最終検証: 60日以上前
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    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    Installed / Running


    製品ID:

    90681


    ウェーハサイズ:

    2"/50mm, 3"/75mm, 4"/100mm


    ヴィンテージ:

    2011


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Working condition, no known issues
    構成
    • Windows Based Operator Workstation • Drawer in Front (B) Base Configuration • Robotic Loader • PATMAX MVS Alignment System • Step Specific Processing Mode Software • 30 x 15 mm Field Size - Manual Aperture • 6-inSubstrates • 3 X 5 Inch Reticles • Lens Distortion Reference - No Lens Matching • 115V Power Source • Four Color Signal Light Tower • Single Probe Focus Software • Focus Mapping (Grid Focus) Software • MVS Manual Alignment Software • Topside EGA Software * Wafer Thickness Compensator (4 mm Max Thickness)
    OEMモデルの説明
    The Sapphire 100 is also based on the 1000 Series platform, with additional features developed specifically for HBLED lithography applications. HBLED manufacturing requires special substrate handling capabilities for the small diameter sapphire and silicon carbide substrates used to manufacture the LED devices for display backlighting and general lighting applications. For HBLED applications, we believe our Sapphire 100 stepper offers depth of focus, productivity and yield improvement advantages over competitive product offerings.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    VEECO / ULTRATECH SAPPHIRE 100

    VEECO / ULTRATECH

    SAPPHIRE 100

    Lithographyヴィンテージ: 2011状態: 中古最終検証: 60日以上前
    VEECO / ULTRATECH SAPPHIRE 100

    VEECO / ULTRATECH

    SAPPHIRE 100

    Lithographyヴィンテージ: 0状態: 中古最終検証: 60日以上前