説明
Low/Ultra Low Energy Implanter構成
構成なしOEMモデルの説明
Designed for the 300mm market, Quantum is an advanced ion implanter series that utilizes the differential lens technology of the xRLEAP system. It offers enhanced beam optics, resulting in improved low-energy productivity compared to the xRLEAP system. With high beam currents and fast auto-tune capability, Quantum is the industry's most effective ion implanter for applications at 130nm and below. Its new energy control technology ensures excellent energy accuracy and enables ultra-low energy implants with remarkable precision of ±7.5 volts. The This system provides conductive doping for multiple device generations, offering a small-footprint platform for both 200mm and 300mm wafer sizes. The Quantum series excels at low-energy implantation while delivering excellent performance in mid-energy implants (10-80keV). With high current levels, it achieves high production throughput and lower cost of ownership. The market-leading Quantum LEAP system has gained rapid acceptance among chipmakers worldwide for its ability to form ultra-shallow junctions, enabling smaller transistors and higher device speeds.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
QUANTUM II LEAP
検証済み
カテゴリ
Low Energy
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
91868
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
QUANTUM II LEAP
カテゴリ
Low Energy
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
91868
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Low/Ultra Low Energy Implanter構成
構成なしOEMモデルの説明
Designed for the 300mm market, Quantum is an advanced ion implanter series that utilizes the differential lens technology of the xRLEAP system. It offers enhanced beam optics, resulting in improved low-energy productivity compared to the xRLEAP system. With high beam currents and fast auto-tune capability, Quantum is the industry's most effective ion implanter for applications at 130nm and below. Its new energy control technology ensures excellent energy accuracy and enables ultra-low energy implants with remarkable precision of ±7.5 volts. The This system provides conductive doping for multiple device generations, offering a small-footprint platform for both 200mm and 300mm wafer sizes. The Quantum series excels at low-energy implantation while delivering excellent performance in mid-energy implants (10-80keV). With high current levels, it achieves high production throughput and lower cost of ownership. The market-leading Quantum LEAP system has gained rapid acceptance among chipmakers worldwide for its ability to form ultra-shallow junctions, enabling smaller transistors and higher device speeds.ドキュメント
ドキュメントなし