説明
Applied Materials Centura SiNgenPlus Low Pressure Chemical Vapor Deposition Furnace構成
3 chambers SiNgen, 2 orienter/ EMP cool downThermal NitrideOEMモデルの説明
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
CENTURA SINGEN
検証済み
カテゴリ
LPCVD Poly
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
不明
製品ID：
93181
ウェーハサイズ：
不明
ヴィンテージ：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA SINGEN
検証済み
カテゴリ
LPCVD Poly
最終検証： 29日前
主なアイテムの詳細
状態：
Parts Tool
稼働ステータス:
不明
製品ID：
93181
ウェーハサイズ：
不明
ヴィンテージ：
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Applied Materials Centura SiNgenPlus Low Pressure Chemical Vapor Deposition Furnace構成
3 chambers SiNgen, 2 orienter/ EMP cool downThermal NitrideOEMモデルの説明
Silicon Nitride Deposition - Applied offers a single-wafer, high-temperature system to deposit silicon nitride films, called the SiNgen™ Centura. This system operates at a lower deposition temperature than conventional methods to minimize the amount of time the wafer is exposed to high temperatures and to reduce particles while improving many areas of operating cost and productivity in critical transistor nitride layers for sub-0.18 micron devices.ドキュメント
ドキュメントなし