1          SUSS MA8 MASK ALIGNER /WD-33/MAN

2          ALIGNMENT STAGE MA/BA6-8/WD-33/MAN/A-200 /MAN (mounted on Machine)

3          ENHANCED IMAGE STORAGE SYSTEM (EISS 2.0) FOR MA8/BA8 (mounted on Machine)

4          SUSS DVM8 MICROSCOPE MA8/BA8 , CPL. Incl. Cable

5          OBJECTIVE UMPL FL 5X/0.15

6          OBJECTIVE LMPLFL 10X/0.30

7          OBJECTIVE LMPLFL 20X/0.40

8          SET OF TURRETS FOR 3 OBJECTIVES (mounted on DVM6/8)

9          LED LSB-W200 EXPOSURE SYSTEM

10        CHUCK MA8/BA6/BSA/CONT/W-200

11        ADAPTER KIT FOR MH MA8/BA6/AA-33 - mounted on AL.STAGE)

12        MASK HOLDER MA8/BA6/BL/PROX/CONT/M-9/TH-3-6.5/W-200

13        SUSS UV OPTOMETER CASE CPL.

14        SUSS UV LIGHT MEASURING PROBE 365/405NM for UV OPTOMETER

15        EXPOSURE TEST DIAL 200MM

16        UV EYE PROTECTION GLASSES

            ACCESOIRES:

            MONITOR incl. CABELSET

            6-FACH STECKDOSE ,  KEYBOARD, FOOTSWITCH, ADAPTER EISS2.0

            SAFETY AND INSTALLATION MANUAL MA6-8/BA6, MQS-EISS2.0 MANUAL,USB-BACKUP

            MA8BA6 COVER left

            HOSE SET LABORATORY-ALIGNER and 5 pieces T-Connection 1/4"

            MASK HOLDER SHELF WITH  MATCHING SCREWS

            TRANSPORT SAFETY SET

            BOX-VERPACKUNGSKISTE 144X177X215

SUSS MicroTec offers a wide product portfolio of high quality process solutions for the semiconductor industry and related markets. SUSS portfolio covers a comprehensive range of products and solutions for backend lithography, wafer bonding, and photomask processing, complemented by micro-optical components.

SUSS MicroTec / KARL SUSS

SUSS MA8 mask alignment lithography machine is a lithography application solution developed for the R&D and trial production of 200mm IC back-end process. MA8 can fully meet the powerful functions and flexibility required by the laboratory. The compatibility of the exposure mode fully allows the process developed on the MA8 to be transplanted to the MA200 production mask alignment lithography machine of SUSS , and be applied in actual production.

MA8 can meet the needs of back-end processes, such as passivation and thin film bumping technology. Similarly, thick resist lithography and backside alignment capabilities make MA8 also have great application prospects in microsystem technology. In addition, MA8 is also considered as an ideal tool for communication and optoelectronic applications.

After adopting the low-diffraction exposure system, in addition to high-resolution standard lithography applications, the MA8 mask alignment lithography machine can also complete the following special technologies:

Bond alignment
near-field holographic lithography ,
UV processing
UV curing nanoimprinting, etc.

MA8/BA8

B8B1ADDB-EA8C-4CDD-B884-45A6857F803A.jpeg

08EB5528-3154-4497-9485-7DF70EC30FB9_1_201_a.jpeg

E9A670D1-F1C6-44DA-BE55-5ADE7BE337A9.jpeg

2A4650F5-AAC6-4E38-8FBB-441BC3F68881.jpeg

177E95BC-90B8-4FBA-B054-9E54A5BDAD50.jpeg

EB69C17D-5B6B-4B4A-AD08-106ED9022198.jpeg

A9FD81FE-184D-40D7-8C7D-413B3898F732.jpeg

A45D9770-F8F4-4540-9CAE-B3A3CC063E0A.jpeg

FD0DE52D-6795-4E78-8BA3-B8DAB9F308CF.jpeg

12422D36-0673-4822-92F7-4B12730DF719.jpeg

BF116CB5-5CF3-4089-9D87-C85E1D35637A.jpeg

272C2F28-3C19-41B5-ABFE-377DB68FF6DB_1_201_a.jpeg

SUSS MicroTec / KARL SUSS

MA8/BA8

Mask/Bond Aligners

同様のリスト

SUSS MicroTec / KARL SUSS

MA8/BA8

SUSS MicroTec / KARL SUSS

MA8/BA8

SUSS MicroTec / KARL SUSS

MA8/BA8

SUSS MicroTec / KARL SUSS

MA8/BA8

SUSS MicroTec / KARL SUSS

MA8/BA8

MA8/BA8

Mask/Bond Aligners

同様のリスト

SUSS MicroTec / KARL SUSS

MA8/BA8

SUSS MicroTec / KARL SUSS

MA8/BA8

SUSS MicroTec / KARL SUSS

MA8/BA8

SUSS MicroTec / KARL SUSS

MA8/BA8

SUSS MicroTec / KARL SUSS

MA8/BA8