Imperia is a photoluminescence (“PL”) full wafer imaging and mapping system designed for high-volume compound semiconductor metrology applications including power control and photonics applications adding significant inspection and substrate metrology capability to the established PL fleet.

ONTO / NANOMETRICS / ACCENT / BIO-RAD

IMPERIA

Vertex is the latest addition to the RPM family and is designed to deliver industry-leading accuracy, repeatability, and tool-to-tool matching. It is a PL Mapping System with Power Density Control that brings the PL measurement process under control, ensuring that your epitaxial process stays firmly under control. Vertex provides accurate, precise, and repeatable PL metrology across the entire wavelength range, including high-Al content AlGaN alloys for GaN FET’s and UV lasers to the Antimonides out in the MIR and everything in between. It offers a catalog of more than 15 standard lasers and the ability to fiber-feed a virtually unlimited array of sources. The monochromator can be fitted with up to three gratings and two array detectors, and every optical component is selected under computer control. Vertex also contains its own built-in spectral source for monochromator calibration. The system can accommodate up to 4 internally mounted lasers, two of which feature a continuously-variable power control with feedback loop. Large lasers can be fiber-connected, and for film thickness measurements, the system can be fitted with a white light source. The Vertex software also includes a Fourier Transform facility for data interpretation.

VerteX

VERTEX-SM-110	

The Trajectory T³ is a cutting-edge metrology module developed by Nanometrics for monitoring and controlling critical processes in semiconductor fabs worldwide. It has been approved for integration by leading process tool manufacturers and has set new standards for speed, reliability, and cost. With its robust large area optical collectors, simple yet powerful spectral detectors, and a MTBF of over 10,000 hours, the Trajectory T³ minimizes cost while maximizing performance. Capable of processing over 250 wafers per hour, it can measure every process wafer even on the fastest process tools. By enabling process tools to measure thicknesses inside the tool and inside the wafer’s patterned devices, the Trajectory T³ delivers unparalleled advantages in speed, reliability, and cost. It is truly changing the game in integrated metrology.

TRAJECTORY T3

The Nanometrics FLX is a flexible metrology system that offers cost-efficiency and high throughput for 300 mm standalone metrology. It is based on Nanometrics’ proven integrated metrology solutions and can support up to four integrated metrology modules simultaneously. The tool can mix-and-match any combination of modules to form a complete metrology solution for lithography, CMP, etch, and CVD/deposition processes. This capability accelerates process development through parallel development of integrated metrology solutions. The system offers industry-leading throughput of 250-500 wafers fueled by dual multi-axis wafer-handling robots.

ZBeam

The DiVA D210 is a dual-channel synchronous pulse source measurement unit from Accent Optical Technologies. It provides pulse widths down to 100ns and a dc measurement capability. The output voltages range from -10V to +10V with a maximum current of 500mA. It supports FETs, HEMTs, NPN and PNP bipolar/HBT and diodes, and has an intuitive Windows® interface. It is a compact single box solution with high throughput and can be controlled from 3rd party programs. It also has I(V) parameter fitting for HEMT and FET models.

DiVA D210

VERTEX SM-230

M6100UV-L6

M6100UV

Electron mobility in very high resistivity films or at extremely low current levels.

HL5580

The Q240AT incorporates the same measurement technology as the Caliper, and delivers the same advanced measurement capabilities for 200mm wafer sizes.


Q240AT

The recently introduced Nanometrics Orion, Advanced Overlay Control System provides enhanced measurement performance and higher wafer throughput and replaces the original Metra line of products. The system is based on the highly successful Atlas platform and offers high throughput in excess of 180 wafers per hour. Orion utilizes a proprietary optical system to provide low total measurement uncertainty (TMU), enabling 1 nanometer, 3-sigma precision in overlay control applications. Orion’s aerial image metrology with proprietary digital image folding tolerates wide process variations and reduces the possibility of erroneous data. Both attributes are crucial elements in attaining high yields in 200mm and 300mm volume production.

ORION

CDS200 is a 200mm Critical Dimension Control System that offers fast and non-destructive critical dimension metrology. It is designed for use in R&D, production, and quality control environments, providing improved process control and high throughput. The system is fully automated and can accurately measure critical dimensions as small as 70nm, while also determining cross-sectional profile and layer thickness. This makes it an ideal tool for ensuring precise measurements and process control in a variety of applications.

ONTO / NANOMETRICS / ACCENT / BIO-RAD

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VERTEX-SM-110

TRAJECTORY T3

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