The CAMECA IMS-6f is an ultra-high vacuum (UHV) system designed for secondary ion mass spectrometry (SIMS) analysis. Equipped with a magnetic sector analyzer, it offers exceptional mass resolving power, with a minimum m/Dm of 25000 (10% definition). The system features a duoplasmatron source that can produce O2+ or O- ions, and a microbeam source for Cs+ ions, providing premium beam stability and ultra-fine minimum beam size (300nm for O2+ and 200nm for Cs+). Key capabilities of the IMS-6f include low detection limits and high resolving power in depth profiling, ultra-shallow depth profiling, 3D ion imaging, and excellent charge neutralization, making it an advanced tool for studying material surfaces and interfaces at the nanoscale.

CAMECA

IMS-6f

LEXFAB300

EX 300

The Cameca IMS 4F is the successor to the IMS 3F and contains all the features of its predecessor plus improvements of the basic instrument as well as new accessories. It is an ion microprobe that is based on the phenomenon of ion-induced sputtering of a solid sample by an energetic primary ion beam, typically consisting of oxygen or cesium ions at beam energy of 5 – 20 keV. It is a tool for investigating isotopic composition in the chemical, material, geological and biological sciences and can detect all elements (H to U) in depth profiling, surface, bulk and microanalysis modes.

IMS-4F

NanoSIMS 50L

IMS 5fE7

SC ULTRA

SIMS 4550

IMS WF

IMS 7f-GEO

IMS 1300-HR³

KLEORA

IMS 7f-Auto

AKONIS

The CAMECA ISM 6f-E7 is a secondary ion mass spectrometer (SIMS) used in the semiconductor industry for depth profiling of semiconductor devices.  The ISM 6f-E7 ion source is designed to be compatible with CAMECA SIMS instruments, such as the CAMECA IMS 7f-Auto or the CAMECA NanoSIMS, offering seamless integration and optimized performance.

ISM 6f-E7

CAMECA

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IMS-6f

LEXFAB300

EX 300

IMS-4F

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すべてのCAMECA Metrology