Thermo Fisher Scientific Inc. (NYSE: TMO), the world leader in serving science, today announced that it has completed its acquisition of FEI Company, Inc. (NASDAQ: FEIC), the leader in high-performance electron microscopy. FEI and Philips joined their technologies in 1993 to create the first DualBeam (FIB/SEM) workstation.

The Thermo Scientific Meridian 4 System is the preferred choice for developers of advanced, low-voltage, high-density semiconductor devices requiring performance and the ability to diagnose wide-ranging failure modes, including parametric failures and those resulting from design-process marginalities.

THERMOFISHER SCIENTIFIC / FEI / PHILLIPS

MERIDIAN IV

The Helios NanoLab 660 is a state-of-the-art DualBeam system developed by FEI. It combines the power of both ion and electron beams to provide FIB (Focused Ion Beam) and SEM (Scanning Electron Microscopy) capabilities in a single machine. This system is designed to provide detailed, multi-dimensional insights at a sub-nanometer resolution. It incorporates the latest advances in field emission SEM (FESEM) and focused ion beam (FIB) technologies, allowing for their combined use. As the 11th DualBeam platform from FEI, the Helios NanoLab 660 opens up new possibilities for extreme high-resolution 2D and 3D characterization, nanoprototyping, and high-quality sample preparation.

HELIOS NANOLAB 660

The FEI Strata 205 is a FIB microscope that employs a gallium liquid metal ion source. The microscope has an accelerating voltage range of 5 kV to 20 kV, a resolution of 7 nm, and a beam current range of 1 pA to 20 nA. The system is equipped with a 5-axis motorized table and a gas injection system for depositing conductors and insulators, as well as etching samples. The FEI Strata 205 also features IntelliTune for automated detection depending on the task, user-friendly automated mapping software, and automated image processing for improved results. 

STRATA 205

The FEI Strata 400 STEM is a type of DualBeam™ system that combines the capabilities of a field emission scanning electron microscope (SEM) column with those of a focused ion beam (FIB) column to provide high-resolution, high-contrast imaging and specimen preparation. This system features complete in-situ sample preparation capabilities and high-resolution imaging, allowing TEM samples to be prepared without breaking vacuum. The Strata 400 STEM is specifically designed to meet the growing demand for high-resolution analytical capabilities as device geometries shrink below 100 nm and new materials are introduced. It includes integrated sample lift-out and handling, as well as SEM-STEM (scanning transmission electron microscopy) imaging, enabling high-contrast, high-resolution analysis.

STRATA 400 STEM

Equipped with cryo-shields for contamination-free observation, added liner-tube IGP and standard TMP on the airlock - Patented TWIN objective

TECNAI 20 TWIN

The FEI Nova NanoLab 400 is a dual beam device that comes with both a Focused Ion Beam (FIB) and a Field Emission Scanning Electron Microscope (SEM). It is designed to provide high-resolution imaging and analysis, and features a motorized stage for improved results. Another model from FEI, the Helios NanoLab 400, has a five-axis stage that can move 100 mm in both the X and Y directions. Its all-axis piezo drive and chamber mounting offer top-of-the-line stage repeatability. Samples as large as 100 mm can be loaded through the load lock for maximum efficiency. 

NOVA 400 NANOLAB

The DualBeam 865 is a FIB/SEM system with 3DCD automation designed to provide thin film head manufacturers with fast, precise, automatic, three-dimensional CD (critical dimension) measurements. The system is capable of measuring multi-layer three-dimensional structures that are difficult or impossible to see with conventional, single-layer, top-down techniques. It automatically ion-mills a cross section, acquires a high-resolution SEM image of the exposed face, and measures cross-sectional CDs to provide fast, precise control of the head manufacturing process. The DualBeam 865 integrates high-performance subsystems such as the Magnum ion column and the dual-mode Hexalens electron column for faster milling and high-resolution SEM imaging. Advanced 3DCD automation permits unattended operation for increased operator productivity and the system is fully compliant with the fab environment and multi-vendor yield management data systems.

DUALBEAM 865

The Helios NanoLab 600 is a Dual Beam FIB/SEM (Focused Ion Beam/Scanning Electron Microscope) that is designed for high-end imaging during failure analysis. It features an extreme high-resolution column, a fine-probe ion source, and a 150 x 150 mm, five-axis, XY piezo stage. This makes it a smart investment for failure-analysis labs that require versatile sample handling, from packaged parts to eight-inch wafers. The Helios NanoLab 600 is particularly useful for cross-sectioning samples and delivers three-dimensional imaging, allowing you to quickly and efficiently locate and view device features from different angles. Additionally, patented beam chemistries can be used to highlight interface layers for imaging in the system, providing you with the most accurate data possible without additional preparation steps outside the system.

HELIOS NANOLAB 600

The FEI Helios NanoLab 450 is a DualBeam™ system designed for imaging, analysis, and TEM sample preparation in semiconductor failure analysis labs. It is intended for advanced semiconductor labs that face various challenges, such as decreasing dimensions at sub 32-nm nodes, advanced packaging methods, and an increased number of samples that require TEM imaging. The Helios NanoLab series combines the Elstar electron column with UC technology for high-resolution and high-contrast imaging and the TomahawkTM ion column for quick and accurate sample cross-sectioning. The Helios NanoLab 450S is well-suited for high throughput and high-resolution S/TEM sample preparation, imaging, and analysis. Its unique FlipStage and in-situ STEM detector can switch from sample preparation to STEM imaging in seconds without breaking the vacuum or exposing the sample to the environment.

HELIOS NANOLAB 450

The Helios NanoLab 400 is a DualBeam system that integrates both ion and electron beams for Focused Ion Beam (FIB) and Scanning Electron Microscopy (SEM) functionality in one machine. This allows users to switch between the two beams for quick and accurate navigation and milling. The convergence of the SEM and FIB at a short working distance enables precision “slice-and-view” cross-sectioning and analysis at high resolution. This system provides a powerful tool for sample preparation and analysis.

HELIOS NANOLAB 400

FEI’s Strata 400 STEM is a high-resolution analytical tool designed to support the increasing need for high-resolution analytical capabilities as device geometries shrink below 100 nm and new material systems are introduced. It includes integrated sample lift-out and handling, with SEM-STEM imaging to enable high-contrast, high-resolution analysis. The innovative Flipstage™ moves the sample from milling to STEM-imaging position in seconds, without breaking vacuum, while the new Sidewinder™ ion column provides improved sample throughput and ultimate sample quality. 

STRATA 400

The FEI Nova NanoLab 200 is a powerful tool for researchers and developers working with complex structures below 100 nanometers. It combines ultra-high resolution field emission scanning electron microscopy (SEM) and precise focused ion beam (FIB) etch and deposition to provide advanced capabilities and flexibility. This tool complements existing nanotechnology laboratory tools and extends the range of applications for nanoscale prototyping, machining, 2D and 3D-characterization, and analysis.

NOVA 200 NANOLAB

The Helios NanoLab 400S is a DualBeam system from FEI that integrates both ion and electron beams for FIB (Focused Ion Beam) and SEM (Scanning Electron Microscopy) functionality in one machine. This allows users to switch between the two beams for quick and accurate navigation and milling. The convergence of the SEM and FIB at short working distance enables precision “slice-and-view” cross-sectioning and analysis at high resolution.

THERMOFISHER SCIENTIFIC / FEI / PHILLIPS

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トップTHERMOFISHER SCIENTIFIC / FEI / PHILLIPS Microscope

STRATA 205

TECNAI 20 TWIN

STRATA 400 STEM

DUALBEAM 865

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すべてのTHERMOFISHER SCIENTIFIC / FEI / PHILLIPS Microscope